Description
- ISBN-10: 0854044655
- ISBN-13: 978-0854044658
- Publisher: Royal Society Of Chemistry
- Publication date: 22 December 2008
- Language: English
- Dimensions: 18.9 x 3.81 x 24.61 cm
- Print length: 600 pages
Availability: In Stock
Chemical Vapour Deposition: Precursors, Processes and Applications
SKU: 9780854044658
Original price was: ₹23,894.03.₹19,115.22Current price is: ₹19,115.22.
Explore the cutting-edge of materials science with ‘Chemical Vapour Deposition: Precursors, Processes and Applications’. This comprehensive guide offers an in-depth look at thin film deposition techniques, from thermal processes to atomic layer deposition. Authored by leading international experts, it bridges chemistry, physics, materials science, and engineering. Discover fundamental concepts like reactor design and precursor chemistry, followed by detailed applications in semiconductors, metals, and coatings. Uniquely, this book also delves into the industrial and commercial aspects of CVD, including future trends. Ideal for researchers, students, and practitioners entering the field, this essential text provides a detailed, up-to-date, and logical overview of CVD processes, making it a valuable resource for undergraduate and postgraduate courses and a key reference for the “The bookish owl” community.
5 in stock
