Master the cutting-edge of semiconductor fabrication with this essential guide to sub-half-micron lithography for ULSIs. Explore breakthrough techniques vital for the continuous miniaturization of electronic devices. This book details advanced methods like deep UV, X-ray, electron-beam, and focused ion-beam lithography, explaining core principles and future prospects in microelectronics. Discover the key advancements driving the next generation of semiconductor manufacturing. An indispensable resource for engineers, researchers, and students focused on advanced semiconductor technology and ULSI development in India’s burgeoning electronics industry.