Unlock the complexities of Nano-CMOS circuit and physical design with this essential guide from Wiley-IEEE Press. Drawing from years of expertise, this book expertly connects physical design, circuit design, fabrication, manufacturability, and yield. Explore critical topics including sub-wavelength optical lithography, the effects of process scaling on circuit and physical implementation, low-power design with leaky transistors, and Design for Manufacturability (DFM). Ideal for engineers and researchers seeking to understand the nuances of modern semiconductor design, this resource is your key to navigating the challenges of nano-scale CMOS technology and achieving optimal performance and yield. A must-have for professionals in the field.