Description
- ISBN-10: 1032386738
- ISBN-13: 978-1032386737
- Edition: 1st
- Publisher: CRC Pr I Llc
- Publication date: 5 May 2025
- Language: English
- Dimensions: 15.6 x 1.98 x 23.39 cm
- Print length: 376 pages
Availability: In Stock
Machine Learning-based Modelling in Atomic Layer Deposition Processes (Emerging Materials and Technologies)
SKU: 9781032386737
Original price was: ₹5,948.81.₹4,759.05Current price is: ₹4,759.05.
Explore the cutting edge of thin film technology with “Machine Learning-based Modelling in Atomic Layer Deposition Processes.” This pioneering book from The Bookish Owl offers an in-depth look at applying AI and ML to Atomic Layer Deposition (ALD), a critical area for advanced materials and technologies. Discover how ML-based modeling enhances process quality control and facilitates new material discovery, bridging the gap between classical simulation and modern machine learning techniques. Learn about predictive analysis, deep learning algorithms, and their practical applications in ALD. Essential for materials scientists and engineers, this resource fills key knowledge gaps and opens doors for future research and industrial innovation in ML-enhanced ALD.
5 in stock
